UBS says China is unlikely to match ASML’s top tool this decade

UBS analysts say China’s lithography programme is at roughly the stage ASML reached in 2004 and will not produce a viable EUV alternative within a decade. They also expect China to reach high-volume manufacturing of immersion DUV machines in two to five years, which is the category the Dutch government controls through export licences. China […] This story continues at The Next Web

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